JH-100 Optical Cement Drying Table for University Wafer Production Line Total Solution

Product Overview

The JH-100 Photoresist Baking Hotplate is a key equipment for university microelectronics wafer fabrication training lines — it specializes in drying photoresist-coated wafers, with precise temperature control and stable heating performance to meet academic teaching & lab prototyping needs.

Key Specifications

• Specification Item	Details
  Model Number	JH-100
  Application	Drying photoresist-coated wafers (for university microelectronics wafer fabrication lab)
  Heating Plate Material	Stainless steel (corrosion-resistant)
  Substrate Size	150mm × 150mm (square)
  Temperature Range	Room temperature to 300℃
  Temperature Control Mode	Digital display & timing control
  Temperature Resolution	0.1℃
  Temperature Accuracy	±0.5℃
  Temperature Uniformity (Working Area)	≤1.5%
  Power Input	AC220V, 800W
  Product Dimensions (W×D×H)	250mm × 180mm × 115mm

Advantages for University Labs

• Tailored for Wafer Fabrication Teaching Perfectly matches the 1μm process wafer production training line, compatible with common lab wafer sizes for photoresist drying processes

• Stable & Precise Heating High uniformity heating (≤1.5% 温差) ensures consistent photoresist curing effects, critical for teaching experiment repeatability

• Compact & Easy to Operate Small footprint fits lab workbenches; digital display + simple button control lowers the learning curve for students

Package & Service

• Package: 1 set of JH-100 Photoresist Baking Hotplate

• Service: On-site installation (for lab production line integration) + operation training + 1-year warranty