JX-100 Wafer Photoresist Developer for University IC Fabrication Teaching Line

Product Overview

The JX-100 Photoresist Developer is a dedicated developing equipment for university IC (integrated circuit) fabrication teaching lines — it completes the developing process of exposed wafers, with precise parameter control and safety protection, perfectly fitting academic teaching and lab training scenarios.

Key Specifications

• Specification Item	Details
  Model Number	JX-100
  Application	Developing operation for exposed wafers (university IC fabrication teaching line)
  Applicable Wafer Size	85-100mm
  Spindle Rotation Speed	3000±1rpm
  Wafer Chucking Method	Vacuum adsorption
  Wafer Status Detection Method	Digital vacuum pressure sensor
  Chamber Material	PP (corrosion-resistant)
  Nozzle Quantity	2 columns (1 developer nozzle + 1 pure water nozzle)
  Safety Configuration	Equipped with dedicated fume hood (to protect operator health)
  Power Input	AC220V, 2KW
  Machine Dimensions (L×W×H)	600mm × 400mm × 400mm
  Machine Weight	70KG

Advantages for University IC Labs

• Tailored for IC Teaching Processes Matches the 1μm process IC teaching wafer line, supports standard lab wafer sizes, and fits the developing step in IC fabrication courses

• Stable & Controlled Developing Vacuum adsorption ensures wafer stability during high-speed rotation; dual nozzles (developer/pure water) enable seamless process switching

• Lab Safety-Focused Design PP corrosion-resistant chamber + dedicated fume hood solve the safety risk of developer volatiles, suitable for student teaching environments

Package & Service

• Package: 1 set of JX-100 Photoresist Developer (including developing system, vacuum adsorption module, and fume hood)

• Service: On-site installation (for teaching line integration) + operation training (for teachers/students) + 1-year warranty