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100-10000rpm Wafer Photoresist Coating Machine
The JY-100 Spin Coater is a core equipment for university microelectronics labs (used in wafer fabrication teaching/training). It realizes uniform photoresist coating on wafers via high-speed rotation, with professional safety design and programmable functions to meet academic research & teaching needs.
Specification Item | Details |
Model Number | JY-100 |
Application | High-speed spin coating of photoresist for wafers (university microelectronics lab use) |
Applicable Wafer Size | 86-100mm |
Spin Speed Range | 100-10000rpm |
Spin Speed Resolution | 1rpm |
Spin Acceleration | 100-10000rpm/s |
Maximum Spin Time | 3000s |
Spin Time Accuracy | ≤±0.1s |
Coating Uniformity | ≤±3% |
Chamber Inner Diameter | 150mm (4-side splash-proof design) |
Program Storage Capacity | 10 groups (5 steps per group) |
Safety Configuration | Equipped with dedicated fume hood (to protect operator health) |
Power Input | AC200-230V |
Product Dimensions (W×D×H) | 290mm × 235mm × 185mm |
Tailored for University Teaching Matches the 1μm process wafer fabrication training line, perfect for microelectronics major courses (e.g., semiconductor manufacturing, lithography process)
High Compatibility & Stability Works with standard 86-100mm wafers; stable speed/acceleration control ensures consistent coating results for teaching experiments
Full Safety Protection Integrated fume hood + splash-proof structure solves the safety risk of photoresist volatiles in lab environments
Package: 1 set of JY-100 Spin Coater + dedicated fume hood
Service: On-site installation (for lab production line integration) + operation training (for teachers/students) + 1-year warranty
