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JS-100 Wet Etching Machine for University IC Production Training Line

Product Introduction

The JS-100 Wet Etching Machine is a core multi-process equipment for university IC (Integrated Circuit) fabrication teaching lines — it integrates developing, cleaning, and etching functions in one unit, designed to handle post-exposure wafer processing. With dedicated functional tanks, corrosion-resistant materials, and full safety protection, it perfectly meets the needs of academic teaching, lab training, and small-batch prototyping for microelectronics majors.


Key Functions & Process Coverage

This machine covers 3 critical wet processes in IC wafer fabrication:

1. Developing Process (EPD Tank)

    • Soak wafers to complete photoresist development; supports manual liquid preparation, waste liquid recovery, and discharge.

    • Tank material: PVDF (resistant to organic solvents in developing reagents).

    2. Cleaning Process (Cleaning Tank)

    • Rinse wafers with pure water after developing/etching; equipped with a pure water tap and waste water discharge system.

    • Tank material: PP (corrosion-resistant & easy to clean).

    3. Etching Process (Acid Tank)

    • Soak wafers for material etching; supports immersion heating (30-150℃ temperature control) and waste liquid recovery.

    • Tank material: PTFE (resistant to strong acids/bases in etching reagents).


Product Advantages (For University Labs)

1. Teaching Line Compatibility

Integrates 3 core wet processes in one machine, matching the complete wet process section of 1μm IC teaching wafer lines — ideal for students to learn full-process wafer fabrication.

2. Corrosion-Resistant & Durable

Tanks adopt PVDF/PP/PTFE materials (targeted for different reagents), ensuring long-term use in lab environments with various chemical liquids.

3.Full Safety Protection

    • 4 pairs of imported anti-corrosion gloves (isolate operators from reagents).

    • Automatic liquid level monitoring (prevents overflow).

    • Top exhaust port (φ200mm) with pressure valve (removes volatile fumes, complying with lab safety standards).

      4. User-Friendly for Teaching

    • Manual liquid preparation & operation (fits student hands-on training).

    • Dedicated gas/water configuration (1 air gun + 1 water gun + 1 DI tap) for flexible process adjustment.


Technical Parameters


Specification Item

Details

Model Number

JS-100 

Application

Developing, cleaning & etching for post-exposure wafers (university IC fabrication teaching line)

Functional Tanks

3 dedicated tanks (EPD tank, cleaning tank, acid tank)

EPD Tank Features

Soaking, manual liquid preparation, waste liquid recovery/discharge; material: PVDF

Cleaning Tank Features

Pure water tap, waste water discharge; material: PP

Acid Tank Features

Soaking, manual liquid preparation, immersion heating (30-150℃), waste liquid recovery/discharge; material: PTFE

Gas/Water Configuration

1 air gun + 1 water gun + 1 DI water tap

Tank Size

200mm×200mm×200mm

Waste Liquid Recovery Units

3 (with automatic liquid level monitoring)

Safety Protection Accessories

4 pairs of imported anti-corrosion gloves; top exhaust port (φ200mm, manual pressure valve)

Power Input

AC380V, 9KW

Machine Dimensions (L×W×H)

1900mm × 1150mm × 2025mm

Machine Weight

450KG


Service & Support

  • Installation: On-site installation & integration into your university’s IC teaching production line.

  • Training: Free operation training for teachers & students (covers process setup, safety operation, and maintenance).

  • Warranty: 1-year warranty + lifetime technical support.


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