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Magnetron Sputtering System for University IC Fabrication Training Line

Product Overview

The JC-100 Magnetron Sputtering System is a key metallization equipment for university IC (Integrated Circuit) fabrication teaching lines — it deposits metal films on wafers via high-vacuum magnetron sputtering, with dual-target configuration, precise process control, and user-friendly design, tailored for academic teaching, lab training, and microelectronics course experiments.


Key Specifications


  • Specification Item

    Details

    Model Number

    JC-100 

    Application

    Wafer metallization (metal film deposition) for university IC fabrication teaching line

    Applicable Wafer Size

    6" (φ150mm)

    Vacuum Chamber

    φ500×H420mm, SUS304 stainless steel

    Vacuum System

    Compound molecular pump + direct-coupled high-vacuum pump + high-vacuum valve + digital vacuum gauge

    Ultimate Vacuum

    6.0×10⁻⁵Pa (after 24h idle pump-down)

    Vacuum Pumping Speed

    From atmosphere to 5.0×10⁻³Pa in ≤15min (idle)

    Sputtering Targets

    2 sets of 3" permanent magnet confocal sputtering targets (angle & position adjustable)

    Wafer Stage Rotation Speed

    0-20 rpm (adjustable)

    Power Supply Configuration

    2×1kW DC pulse sputtering power supplies + 1×-1kV bias power supply

    Film Thickness Uniformity

    ≤±5%

    Control System

    PLC + touch screen

    Power Input

    AC380V 50Hz (three-phase five-wire), total power ≤10kW

    Machine Dimensions (L×W×H)

    1356mm × 1100mm × 1852mm

    Machine Weight

    650KG


Advantages for University IC Labs

1. Teaching Process CoverageSupports wafer metallization (a core step in IC fabrication), allowing students to learn physical vapor deposition (PVD) principles and operation in microelectronics courses.

2. Dual-Target Flexible ExperimentationTwo independent sputtering targets enable deposition of single/stacked metal films, supporting diverse teaching scenarios and student project needs.

3. High-Precision & Stable Performance

    • Ultra-high vacuum environment ensures film purity; ±5% uniformity guarantees consistent experimental results.

    • PLC + touch screen control simplifies operation, lowering the learning curve for students.

    4. Safety & ReliabilityEquipped with pneumatic baffle structure and interlock protection, meeting university lab safety standards for high-vacuum equipment.

Package & Service

  • Package: 1 set of JC-100 Magnetron Sputtering System (including vacuum chamber, dual sputtering targets, power supplies, and control system)

  • Service: On-site installation (integrated into teaching production line) + operation training (for teachers/students) + 1-year warranty


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